主要特點：

刻蝕用陶瓷環(huán)材質為高純氧化鋁陶瓷 、氧化鋯陶瓷及碳化硅陶瓷，具有硬度高，耐磨損、精度保持性好，很好的耐等離子體轟擊特性。并且高純高性能工程陶瓷材料能夠很好的解決新一代刻蝕技術中等離子體腐蝕、微粒產生、金屬污染和氧氣分解等問題。

Main features

Ceramic rings for etching are made of high purity alumina ceramics, zirconia ceramics and silicon carbide ceramics. They have

high hardness, good wear resistance, good accuracy and good resistance to plasma bombardment. Moreover, high purity and high performance engineering ceramics can solve the problems of plasma corrosion, particle generation, metal pollution and oxygen decomposition in the new generation of etching technology.

應用領域：

主要用于LED 襯底材料、半導體材料及外延材料的等離子刻蝕設備中，對設備刻蝕腔體的很好的防護作用。

Application

It is mainly used in plasma etching equipment of LED substrate material, semiconductor material and epitaxy material. I t has a good protective effect on etching cavity of equipment.

規(guī)格型號：

根據用戶需求，可設計和制造各種標準及非標準的陶瓷環(huán)產品。

Specification:

According to user requirements, various standard and non-standard tool holders can be designed and manufactured.